查看完整版本: DNA used as a template for nanolithography

DNA used as a template for nanolithography

[size=5][b]DNA used as a template for nanolithography[/b][/size]

[b][纳米科技世界快讯]DNA is one of the most popular building blocks of nanotechnology and is commonly used to construct ordered nanoscale structures with controlled architectures. For the most part, DNA is looked upon as a promising building block for fabricating microelectronic circuits from the bottom up.[/b]

Now a team of researchers at Young propose the marriage of DNA self-assembly with standard microfabrication and lithography tools to form features such as nanochannels, nanowires, and nanoscale trenches. This discovery may open up new avenues for nanofabrication at dimensions not accessible by conventional optical lithography.

Adam Woolley and Héctor Becerril have developed a method to use DNA molecules as templates to define patterns on substrates. The researchers deposit metal films over DNA molecules aligned on a substrate. The DNA molecules essentially act as nanostencils to define sub-10-nm-sized patterns on the substrate. The researchers call this process “DNA shadow nanolithography” because the metal film is deposited at an angle and the shadow cast by the DNA molecules defines the dimensions of the features on the substrate.

Anisotropic etching of the patterned surfaces using reactive gas plasmas, a commonly used fabrication tool in the semiconductor industry, yields high-aspect-ratio trenches on the substrate. The trenches can be sealed at the top to form continuous enclosed nanochannels. Alternatively, the trenches can be chemically functionalized and used as templates for the deposition of metal nanowires such as those of nickel, copper, or silver. The templated trenches and nanowires have lateral dimensions less than 30 nm and can be tailored to be less than 10 nm. The exact dimensions of the trenches can be varied by tuning the angle of deposition and the thickness of the deposited film.

The researchers believe that it should be possible to transfer complex patterns onto substrates using surface-aligned DNA molecules. “One remarkable aspect of this technology is that it utilizes the patterning ability of DNA without requiring the nucleic acid to remain in the final construct”, said Woolley, adding that the nanostructures fabricated by DNA shadow nanolithography may find use as nanofluidic channels and chemical sensors.

Citation: Adam T. Woolley, [color=Blue]DNA Shadow Nanolithography[/color],[b][i] Small[/i][/b] 2007, 3, No. 9, 1534–1538, doi: 10.1002/smll.200700240

Source: Wiley

谢谢分享，要是能提供下载就好了。:victory:

[size=5]科学家用DNA作为纳米印刷模板[/size]

教育部科技发展中心网2007年9月4日报道  DNA是纳米技术中最常使用的建筑模块，通常被用来控制建造有序的纳米结构。在很大程度上，人们认为DNA有望成为自下而上制造微型电子线路的基本模块。

    现在，一组来自美国Brigham Young大学的科学家们把DNA自组织技术同微制造印刷术结合起来，制造纳米通道、纳米线和纳米沟等结构。这项发现为目前光学印刷术所达不到的尺寸下的纳米加工开辟了新的路径。他们的成果发表在最新一期的《Small》上。

    研究人员Adam Woolley和Héctor Becerril发明了一种利用DNA为模板来定义基底图案的方法。他们把DNA在基底上排列整齐，再在上面沉积一层金属膜。DNA分子起纳米蜡纸的作用，这样来在基底上定义一些小于10纳米的图案。由于金属膜以一定角度沉积，DNA分子的投影来定义基底上图案的尺度，因此这种方法被研究人员称为 “DNA投影纳米印刷术”。

    此后研究人员使用半导体工业中常用的活性气体等离子体对图案表面进行各向异性刻蚀，在基底上得到了高纵宽比的沟槽。这些沟槽可以在顶端密封，来形成连续的纳米通道；或者可以被化学功能化，作为沉积金属纳米线的模板。这些模板沟槽和制造出的纳米线横截面只有30纳米，并能被裁剪成小于10纳米。沟槽的确切尺寸可以通过改变沉积角度和沉积厚度来控制。

    研究人员相信能够用表面对齐的DNA分子来实现复杂图案到基底的转换。Wooley说：“这项技术的特点是能利用DNA形成图案，而并不需要DNA保持其核酸结构不变。”他认为DNA投影纳米印刷术能够应用在纳米流体通道和化学传感器领域。