caitokyo 2008-06-13 22:59
请教spin coating
欲用spin coating方法准备高分子薄膜,请问基底需要预先处理吗?如何可以得到比较均匀的薄膜呢?
nanoworker 2008-06-13 23:44
基底一般是用镉酸处理先!除去表面吸附的一些杂质。!}p)uk9B%E#p&l:U
溶液浓度不能太大,转速恒定就可以得到均匀的了
nano 2008-06-13 23:48
[url=http://www.ece.gatech.edu/research/labs/vc/packaging/theory/spin_theory.html]:link [img]http://www.ece.gatech.edu/research/labs/vc/packaging/images/stepstheory/spin_theory.GIF[/img][/url]
nano 2008-06-13 23:53
The Basic Physical Processes that Control Spin Coating
[b][size=+1]The Spin Coating Process can be broken down into several key stages: fluid dispense, spin-up, stable fluid outflow, and finally evaporation dominated drying. [url=http://www.mse.arizona.edu/faculty/birnie/Coatings/KeyStages.htm][color=#0000ff]Click Here for Details[/color][/url][/size][/b]
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[b][size=+1]Fluid Flow on a flat spinning substrate is one of the most important physical processes involved in spin coating. [url=http://www.mse.arizona.edu/faculty/birnie/Coatings/FluidFlo.htm][color=#0000ff]Click Here for Details[/color][/url][/size][/b]
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[b][size=+1]Air Flow [i]above[/i] the spinning wafer is also very important since this exerts most control over the evaporation rate of solvent from the solution. [url=http://www.mse.arizona.edu/faculty/birnie/Coatings/AirFlow.htm][color=#0000ff]Click Here for Details[/color][/url][/size][/b]
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[b][size=+1][color=#0000ff][url=http://www.mse.arizona.edu/faculty/birnie/start.htm]Dunbar P. Birnie, III[/url][/color][/size][/b]
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caitokyo 2008-06-14 08:29
多谢nanoworker和nano:handshake :handshake \V IKz)l-q*B/^
正在研读。。。