nanost-admin 2006-11-16 08:37
实用XPS大全(网上免费资源)
[URL=http://imageshack.us][IMG]http://img170.imageshack.us/img170/9821/xpsprinciple59ge.jpg[/IMG][/URL]
[size=4][b]网上资源(综合性):[/b]
[url]http://www.xpsdata.com/[/url]
[url]http://www.uksaf.org/tech/xps.html[/url]
[url]http://www.polymersolutions.com/xps.html[/url]
[url]http://goliath.emt.inrs.ca/surfsci/links.html[/url]
[url]http://www.npl.co.uk/nanoanalysis/[/url]
[b]学习资源:[/b]
[url]http://goliath.emt.inrs.ca/surfsci/xpslinks.html[/url]
[url]http://www.chem.qmul.ac.uk/surfaces/scc/scat5_3.htm[/url]
[url]http://www.chemistry.adelaide.edu.au/external/soc-rel/content/xps.htm[/url]
[url]http://cmm.mrl.uiuc.edu/techniques/xps.htm[/url]
[url]http://www.csma.ltd.uk/techniques/xray_photoelectron.htm[/url]
[url]http://en.wikipedia.org/wiki/X-ray_photoemission_spectroscopy[/url]
[b]数据库(部分已发,见[/bl]
NIST X-ray Photoelectron Spectroscopy Database
[url]http://srdata.nist.gov/xps/[/url]
" XPS Database Systems, XPS & AES Software & XPS Spectra Handbooks "
[url]http://www.xpsdata.com/[/url]
[swf]http://www.lasurface.com/design/logolasurface.swf[/swf]
[img]http://www.lasurface.com/design/thermo.gif[/img][img]http://www.lasurface.com/design/cnrs.gif[/img]
[url]www.lasurface.com/welfront.htm[/url]
[b]主要软件
[url]http://www.phy.cuhk.edu.hk/~surface/XPSPEAK/[/url]
[url]http://www.casaxps.com/[/url]
[url]http://escalab.snu.ac.kr/~berd/Fitt/fitt.html[/url]
[b]离子溅射产额最新数据：[/b]
（对估算深度剖面分析的厚度和表面刻蚀厚度非常有用）
[url]http://www.npl.co.uk/nanoanalysis/sputtering_yields.html[/url]
[b]找工作:[/b]
[url]http://goliath.emt.inrs.ca/surfsci/jobs/index.html[/url]
[b]主要公司:[/b]
热电(VG)
[url]http://www.thermo.com/com/CDA/Category/CategoryFrames/1[/url],,14934,00.html
PHI ( 或PE物理电子学)
[url]http://www.phi.com/genf.asp?ID=284[/url]
KRATOS
[url]http://www.kratos.com/[/url]
[b]主要参考书:[/b]
[img]http://ec2.images-amazon.com/images/P/0471953407.01._SS500_SCMZZZZZZZ_V1056448241_.jpg[/img]
Practical Surface Analysis -Auger and X-ray Photoelectron Spectroscopy
D. Briggs and M. P. Seah (Editors), Wiley Interscience, 1990 (2nd ed.)
Photoelectron Spectroscopy (Springer Series in Solid-State Sciences Vol. 82)
S. Huefner, Springer Verlag, 1995
Introduction to Photoelectron Spectroscopy (Chemical Analysis Vol. 67)
P. K. Ghosh, Wiley Interscience, 1983
Handbook of Monochromatic XPS Spectra - Vol. 1 - The Elements and Native Oxides
B. V. Crist, XPS International, Inc., 1999
Handbook of Monochromatic XPS Spectra - Vol. 2 - Commercially Pure Binary Oxides
B. V. Crist, XPS International, Inc., 1999
Handbook of Monochromatic XPS Spectra - Vol. 3 - Semiconductors
B. V. Crist, XPS International, Inc., 1999
Handbook of Monochromatic XPS Spectra - Vol. 4 - Polymers and Polymer Damage
B. V. Crist, XPS International, Inc., 1999
Handbook of Monochromatic XPS Spectra - Vol. 5 - Miscellaneous Materials
B. V. Crist, XPS International, Inc., 1999
On-Screen PDF Handbook of Monochromatic XPS Spectra - Vol. 1 - The Elements and Native Oxides, B. V. Crist, XPS International, Inc., 1999
Modern ESCA - The Principles and Practice of X-ray Photoelectron Spectroscopy
T. L. Barr, CRC, 1994
Systematics in the Electronic Stucture of Poly-Valent Liquid Metals Determined by Electron Spectroscopy (Ph.D. Dissertation)
G. Indlekofer, University of Basel, Switzerland, 1987
Photo-electron Spectra Induced by X-rays of Above 600 Non-Metallic Compounds Containing 77 Elements
C. K. Jorgensen and H. Berthou, Munksgaard Publishers, Denmark, 1972
Handbook of X-ray Photoelectron Spectroscopy
J. Moulder, William F. Stickle, P. E. Sobol, and K.D. Bomben, (J. Chastain, editor) Perkin Elmer Corporation (Physical Electronics), 1992 (2nd edition)
Handbook of X-ray Photoelectron Spectroscopy
C. D. Wagner, W. M. Riggs, L. E. Davis, and J. Moulder (G. E. Muilenberg, editor) Perkin Elmer Corporation (Physical Electronics), 1979 (1st edition)
Handbook of X-ray Photoelectron Spectroscopy
N. Ikeo, Y. Iijima, N. Nimura, M. Sigematsu, T. Tazawa, S. Matsumoto, K. Kojima, and Y. Nagasawa, JEOL, 1991
High Resolution XPS of Organic Polymers - The Scienta ESCA300 Database
G. Beamson and D. Briggs, Wiley Interscience, 1992
Practical Handbook of Spectroscopy
J. W. Robinson, CRC, 1991
(XPS BE Tables from K. Siegbahn)
VG Scientific XPS Handbook AdemVG Scientific, 1991 (1st edition)
“表面分析”, 陆家和等编(清华大学),电子工业出版社.
[b]主要学术杂志:[/b]
1. Surface and Interface Analysis
2. Applied Surface Science
3. Surface Science
4. Surface Science Spectra
5. J.Vac.Sci.Technol. A
6. Vacuum
7. Langmuir
8. J.Physical Chemistry B
9. Surface Letter and Review
10. Applied Physics A
11. ………….
[b]元素灵敏度因子(在线):[/b]
[url]http://www.uksaf.org/data/sfactors.html[/url]
[/b]元素结合能(pdf,可下载)[/b]
[url]http://www.xpsdata.com/XI_BE_Lookup_table.pdf[/url]
[b]光电子截面:[/b]
[url]http://xdb.lbl.gov/Section1/Sec_1-5.html[/url]
:lol:
nanosurface 2006-11-24 22:00
Publications
[b]PUBLICATIONS SINCE 1990 [/b]
Publications include basic research to underpin calibration, quantification, measurement and interpretation. References are given below under the following headings, with the most recent publications first in the list.
A one page summary in .PDF format is available for the most recent articles by activating the linked title.
[b]
Applications[/b]
[list][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#app_mass]Mass standards[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#app_metal]Metallurgy[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#app_steel]Steel fracture[/url][/list] [b]
AES[/b]
[list][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#aes_detectors]Detectors[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#aes_energy]Energy calibration[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#aes_intensity]Intensity calibration[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#aes_general]General procedures[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#aes_reviews]Reviews[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#aes_quantification]Quantification[/url][/list] [b]
AFM[/b]
[list][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#afm_general]General[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#spring_force]Spring/Force Constant[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#nanomech]Modulus measurement/ Nanomechanics/ nanoindentation[/url][/list] [b]
Angle-Resolved XPS and Electron Transport[/b]
[list][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_xps]Angle-Resolved XPS and non-destructive depth profiles[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_attenuation]Attenuation Lengths[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_electron]Electron transport[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#arxps]ARXPS[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#layer_thicknesses]Layer thicknesses[/url][/list] [b][url=http://www.npl.co.uk/nanoanalysis/sampub.html#data_formats]Data Formats[/url][/b]
[b][url=http://www.npl.co.uk/nanoanalysis/sampub.html#data_processing]Data Processing[/url][/b]
[b][url=http://www.npl.co.uk/nanoanalysis/sampub.html#quartz_cm]Quartz Crystal Microbalance[/url][/b]
[b]
Sputtering[/b]
[list][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#sputtering_general]General[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#sputtering_depth]Sputter depth profile calibration[/url][/list] [b]
[url=http://www.npl.co.uk/nanoanalysis/sampub.html#standards]Standards[/url][/b]
[b]
SSIMS (Static Secondary Ion Mass Spectrometry)[/b]
[list][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#ssims_damage]Damage[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#ssims_detectors]Detectors[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#ssims_gsims]GSIMS[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#ssims_intensity]Intensity calibration[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#ssims_interpretation]Interpretation[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#ssims_quantification]Quantification[/url][/list]
[b]XPS[/b]
[list][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_damage]Damage[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_detectors]Detectors[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_energy]Energy calibration[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_intensity]Intensity calibration[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_peak]Peak synthesis[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_general]General procedures[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_reviews]Reviews[/url][*][url=http://www.npl.co.uk/nanoanalysis/sampub.html#xps_quantification]Quantification[/url][/list] [b]
[url=http://www.npl.co.uk/nanoanalysis/sampub.html#vamas]VAMAS[/url][/b]
………………………………………………………………………………………………………………………………………………………………………………………………………………………………
Applications
[list][*] Mass standards[list][*][b][url=http://www.npl.co.uk/nanoanalysis/sio2onsi1_263.pdf]Ultra-thin SiO2 on Si: I, Quantifying and Removing Carbonaceous Contamination[/url][/b]
Journal of Vacuum Science and Technology A21 345-352 (2003)
by M P Seah and S J Spencer[*][b]Contamination and Cleaning of a Platinum Alloy: Models and Measurements of the Build-up of Carbonaceous and Mercury Contamination[/b]
ECASIA 95, European Conference on Applications of Surface and Interface Analysis, Eds H J Mathieu, B Reihl and D Briggs, Wiley, Chichester (1996), p 642-646
by P J Cumpson and M P Seah[*][b]Stability of Reference Masses IV: Growth of Carbonaceous Contamination on Platinum-Iridium Mass Standard Surfaces, and its cleaning by UV/Ozone Treatment[/b]
Metrologia 33 507-532 (1996)
by P J Cumpson and M P Seah[*][b]Stability of Reference Masses III: Mechanism and Long Term Effects of Mercury Contamination on Platinum-Iridium Mass Standards[/b]
Metrologia 31 375-388 1994/1995
by P J Cumpson and M P Seah[*][b]Stability of Reference Masses II: The Effect of Environment and Cleaning on the Surfaces of Stainless Steel and Allied Materials[/b]
Metrologia 31 93-108 (1994)
by M P Seah, J H Qiu, P J Cumpson and J E Castle[*][b]Stability of Reference Masses I: Evidence for Possible Variations in the Mass of Reference Kilograms arising from Mercury Contamination[/b]
Metrologia 31 21-26 (1994)
by P J Cumpson and M P Seah[*][b]The Quartz Crystal Microbalance: Radial/Polar Dependence of Mass Sensitivity and Estimates of Off-Electrode Sensitivity[/b]
Measurement Science and Technology (formerly Journal of Physics E) 1 544-555 (1990)
by P J Cumpson and M P Seah[/list][*]Metallurgy[list][*][b]Physical Metallurgy, 4th Revised and Enlarged Edn, Eds R W Cahn and P Hansen[/b]
Elsevier Science Publishers BV, Amsterdam (1996), p1201-1289 Chapter 13, Interfacial and Surface Microchemistry
by E D Hondros, M P Seah, S Hofmann and P Lejcek[*][b]Practical Surface Analysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn.[/b]
Eds D Briggs and M P Seah, J Wiley, London (1990), p 311-356,
Chapter 7, AES in Metallurgy
by M P Seah[/list][*]Steel fracture[list][*][b]A Low Alloy Steel Fracture Sample for Auger Electron Spectroscopy, II: Interlaboratory Tests [/b]
Materials Science and Technology 8 1036-1041 (1992)
by M P Seah, C P Hunt, C M Younes, G C Allen, H Viefhaus, B J Lee, R K Wild, H E Bishop and T English[*][b]A Sub-Monolayer Adsorbate Reference Material Based on a Low Alloy Steel Fracture Sample for Auger Electron Spectroscopy, I: Characterisation[/b]
Materials Science and Technology 8 1023-1035 (1992)
by C P Hunt and M P Seah[/list][/list] [b] AES[/b] [list][*] Detectors[list][*]Martin Seah's 1993 VAM Bulletin Article on Channel Electron Multipliers – full text available for download in Adobe Acrobat format.[*][b]Signal linearity in XPS counting systems[/b]
Journal of Electron Spectroscopy 104 73-89 (1999)
by M P Seah, I S Gilmore and S J Spencer[*][b]Effective Dead Time in Pulse Counting Systems[/b]
Surface and Interface Analysis 23 729-732 (1995)
by M P Seah[*][b]Linearity in Electron Counting and Detection Systems[/b]
Surface and Interface Analysis 18 240-246 (1992)
by M P Seah and M Tosa[*][b]Quantitative AES: Reducing Errors in Measured Analog Spectral Intensities through Control of the Electron Detector[/b]
Surface and Interface Analysis 15 701-704 (1990)
by M P Seah and G C Smith[*][b]Detectors, Ed A Smith, SPIE Optical Engineering Press, Bellingham, WA (1998).[/b]
Energy and Spatial Dependence of the Electron Detection Efficiencies of Single Channel Electron Multipliers used in Electron Spectroscopy
Review of Scientific Instruments 62 62-68 (1991), Reprinted in Photon Counting by M P Seah and G C Smith[*][b]Channel Electron Multipliers: Quantitative Intensity Measurement - Efficiency, Gain, Linearity and Bias Effects[/b]
Journal of Electron Spectroscopy 50 137-157 (1990)
by M P Seah[/list][*] Energy calibration[list][*][b][url=http://www.npl.co.uk/nanoanalysis/calibaesxps_274.pdf]Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy[/url][/b]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p 167-189
Chapter 7, Instrument Calibration for AES and XPS
by M P Seah[*][b]AES: Energy Calibration of Electron Spectrometers IV - A Re-evaluation of the Reference Energies[/b]
Journal of Electron Spectroscopy 97 235-241 (1998)
by M P Seah[*][b]Simple Procedure for Precise Peak Maximum Estimation for Energy Calibration in AES and XPS[/b]
Surface and Interface Analysis 24 687-694 (1996)
by P J Cumpson, M P Seah and S J Spencer[*][b]AES: Energy Calibration of Electron Spectrometers III - general calibration rules[/b]
Journal of Electron Spectroscopy 83 197-208 (1997)
by I S Gilmore and M P Seah.[*][b]Work functions and electron spectroscopy[/b]
Journal of Surface Analysis 1 409-410, 1995
by M P Seah[*][b]A Re-assessment of Energy Transfers on the Quasielastic Scattering of 250 to 3000 eV Electrons at Surfaces[/b]
Physical Review B 47 9836-9839 (1993)
by D Laser and M P Seah[*][b]Practical Surface Analysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn.[/b]
Eds D Briggs and M P Seah, J Wiley, London (1990), p 531-540,
Appendix 1, Spectrometer Energy Scale Calibration
by M P Seah and G C Smith[*][b]AES: Energy Calibration of Electron Spectrometers II - Results of a BCR Interlaboratory Comparison Co-sponsored by the VAMAS SCA TWP[/b]
Surface and Interface Analysis 15 309-322 (1990)
by M P Seah and G C Smith[*][b]AES: Energy Calibration of Electron Spectrometers I - An Absolute, Traceable Energy Calibration and the Provision of Atomic Reference Line Energies[/b]
Surface and Interface Analysis 15 293-308 (1990)
by M P Seah, G C Smith and M T Anthony[/list][*] [/list]
[[i] 本帖最后由 nanosurface 于 2006-11-24 22:13 编辑 [/i]]
nanosurface 2006-11-24 22:14
[b]Intensity calibration[/b]
* Repeatable Intensity Calibration of an X-ray Photoelectron Spectrometer
Journal of Electron Spectroscopy 151 178-181 (2006)
by M P Seah and S J Spencer
* Summary of ISO/TC 201 Standard: XXI, ISO 21270:2004 - Surface chemical analysis - X-rayPhotoelectron and Auger electron spectrometers - Linearity of Intensity Scale
Surface and Interface Analysis 36 1645-1646 (2004)
by M P Seah
* Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p 167-189
Chapter 7, Instrument Calibration for AES and XPS
by M P Seah
* Savitzky and Golay differentiation in AES
Applied Surface Science 93 273-280 (1996)
by I S Gilmore and M P Seah
* A System for the Intensity Calibration of Electron Spectrometers
Journal of Electron Spectroscopy 71 191-204 (1995)
by M P Seah
* Optimisation and Specification of Auger Electron Spectrometer Signal-to-Noise Ratio Performance
Journal of Electron Spectroscopy 67 151-157 (1994)
by M P Seah and C P Hunt
* Scattering in Electron Spectrometers, Diagnosis of Avoidance, II: Cylindrical Mirror Analysers
Surface and Interface Analysis 20 876-890 (1993)
by M P Seah
* Scattering in Electron Spectrometers, Diagnosis and Avoidance, I: Concentric Hemispherical Analysers
Surface and Interface Analysis 20 865-875 (1993)
by M P Seah
* Signal-to-Noise Assessment and Measurement in Spectroscopies with Particular Reference to Auger and X-ray Photoelectron Spectroscopies
Journal of Electron Spectroscopy 61 291-308 (1993)
by M P Seah and P J Cumpson
* Inter-laboratory Tests of a Composite Reference Sample to Calibrate Auger Electron Spectrometers in the Differential Mode
Journal of Electron Spectroscopy 61 173-182 (1993)
by M P Seah, C P Hunt, D Sykes, S Valeri, R Muller and B Lamb
* Development of a Reference Material and Reference Method to Provide a Calibration of the Instrument Intensity Scale for Differential AES
Journal of Electron Spectroscopy 61 149-171 (1993)
by M P Seah, C P Hunt and M Tosa
* AES: Accurate Intensity Calibration of Spectrometers - Results of a BCR Interlaboratory Comparison Co-sponsored by the VAMAS SCA TWP
Surface and Interface Analysis 17 855-874 (1991)
by M P Seah and G C Smith
* VAMAS Study of Intensity Stability of Cylindrical Mirror Analyser Based Auger Electron Spectrometers
Journal of Electron Spectroscopy 58 345-357 (1992)
by M P Seah
* Quantitative AES: Calibration of Spectrometers for TrueSpectral Measurements - Results of a VAMAS Round Robin and Recommendations for Acquiring Reference Data Banks
Surface and Interface Analysis 16, 168-172 (1990)
by M P Seah and G C Smith
* Standard Reference Spectra for XPS and AES: Their Derivation, Validation and Use.
Surface and Interface Analysis 16, 144-148 (1990)
by G C Smith and M P Seah
* Quantitative AES and XPS: Calibration of Electron Spectrometers for True Spectral Measurements - VAMAS Round Robins and Parameters for Reference Spectral Data Banks
Vacuum 41 1601-1604 (1990)
by M P Seah and G C Smith
* Quantitative AES and XPS. Determination of the Electron Spectrometer Transmission Function and the Detector Sensitivity Energy Dependencies for the Production of True Electron Emission Spectra in AES and XPS
Surface and Interface Analysis 15 751-766 (1990)
by M P Seah and G C Smith
[list][*][b]General procedures[/b][/list]
* AES of Bulk Insulators - Control and Characterisation of the Surface Charge
Journal of Electron Spectroscopy 109 291-380 (2000)
by M P Seah and S J Spencer
[list][*] Reviews[/list]
* Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p 167-189
Chapter7, Instrument Calibration for AES and XPS
by M P Seah
* Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p 345-375
Chapter 13, Quantification in AES and XPS
by M P Seah
* Quantitative AES and XPS: Tests of Theory Using AES and XPS Databases with REELS Background Subtraction
Journal of Surface Analysis 9 275-280 (2002)
by M P Seah
* Consistent, Combined Quantitative AES and XPS Digital Data Bases - Convergence of Theory and Experiment
Journal of Vacuum Science and Technology, A18 1083-1088 (2000)
by M P Seah, I S Gilmore and S J Spencer
* New Aspects in Quantitative Surface Analysis
Journal of Surface Analysis 5 7-11 (1999)
by M P Seah
* Quantitative AES and XPS - Convergence Between Theory and Experimental Data Bases
Journal of Electron Spectroscopy 100 55-73 (1999)
by M P Seah
* Reference Data for AES and XPS Combined
Applied Surface Science 144-145 161-167 (1999)
by M P Seah
* Calibration of Auger and X-ray Photoelectron Spectrometers for Valid Analytical Measurements
Spectroscopy Europe 10 8-14 (1998)
by P J Cumpson, S J Spencer and M P Seah
* Practical Analyses of Intensities in AES
ECASIA 97, European Conference on Applications of Surface and Interface Analysis, Eds I Olefjord, L Nyborg and D Briggs, Wiley, Chichester (1998), p 801-804
by M P Seah, I S Gilmore, H E Bishop and G Lorang
* Surface Chemical Analysis: Comparing and Exchanging Data
Journal of Vacuum Science and Technology 15 485-492 (1997)
by M P Seah.
* Practical Surface Analysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn.
Eds D Briggs and M P Seah, J WileyLondon (1990), p 1-18,
Chapter 1, A Perspective of the Analysis of Surfaces and Interfaces
by M P Seah and D Briggs
* Precision, Accuracy and Uncertainty in Quantitative Surface Analysis by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
Journal of Vacuum Science and Technology A8 735-763 (1990)
by C J Powell and M P Seah
[[i] 本帖最后由 nanosurface 于 2006-11-24 22:30 编辑 [/i]]
nanosurface 2006-11-24 22:34
• [b] Quantification[/b]
o Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p 345-375
Chapter 13, Quantification in AES and XPS
by M P Seah
o Resolution Parameters for Model Functions Used in Surface Analysis
Surface and Interface Analysis 33 950-953 (2002)
by M P Seah
o Ultra-thin SiO2 on Si: II, Issues in Quantification of the Oxide Thickness
Surface and Interface Analysis 33 640-652 (2002)
by M P Seah and S J Spencer
o Estimation of inelastic mean free paths for polymers and other organic materials: use of quantitative structure-property relationships
Surface and Interface Analysis 31 23-34 (2001)
by P J Cumpson
o Quantitative AES IX and Quantitative XPS II: Auger and X-ray Photoelectron Intensities and Sensitivity Factors from Spectral Digital Databases Re-analysed using a REELS Database
Surface and Interface Analysis 31 778-795 (2001)
by M P Seah, I S Gilmore and S J Spencer
o Background Subtraction III: The Application of REELS Data to Background Removal in AES and XPS
Surface Science 471 185-202 (2001)
by M P Seah
o Background Subtraction II: General Behaviour of REELS and the Tougaard Universal Cross Section in the Removal of Backgrounds in AES and XPS
Surface Science 461 1-15 (2000)
by M P Seah, I S Gilmore and S J Spencer
o Background Subtraction, I: General Behaviour of Tougaard - Style Backgrounds in AES and XPS
Surface Science 420 285-294 (1999)
by M P Seah
o Quantitative AES, VIII: Analysis of Auger Electron Intensities for Elemental Data in a Digital Auger Database
Surface and Interface Analysis 26 908-929 (1998)
by M P Seah and I S Gilmore
o Quantitative AES, VII: The Ionisation Cross Section in AES
Surface and Interface Analysis 26 815-824 (1998)
by M P Seah and I S Gilmore
o Quantitative AES, VI: Backscattering and Backgrounds - An Analysis of Elemental Systematics and Corrections of Intensity
Surface and Interface Analysis 26 723-735 (1998)
by M P Seah and I S Gilmore
o Quantitative AES, V: Practical Analysis of Intensities with Detailed Examples of Metals and their Oxides
Surface and Interface Analysis 26 701-722 (1998)
by M P Seah, I S Gilmore, H E Bishop and G Lorang
o "In situ" Preparation and Characterisation (AES, XPS) of Thin Thermal Oxide Films as Material Standards for an AES Data Bank
ECASIA 95, European Conference on Applications of Surface and Interface Analysis, Eds H J Mathieu, B Reihl and D Briggs, Wiley, Chichester (1996), p615-618
by G Lorang, J P Langeron and M P Seah
o A High Resolution Digital Auger Database of True Spectra for AES Intensities
Journal of Vacuum Science and Technology 14 1401-1407 (1996)
by M P Seah and I S Gilmore
o An Absolute High Resolution Digital Auger Electron Reference Database
ECASIA 95, European Conference on Applications of Surface and Interface Analysis, Eds H J Mathieu, B Reihl and D Briggs, Wiley, Chichester (1996), p607-610
by M P Seah, I S Gilmore, P J Cumpson, J P Langeron and G Lorang
o Quantitative AES IV: Accuracy of the numerical evaluation of Peak Areas in AES using the Universal Tougaard Background Subtraction Method
Surface and Interface Analysis 24 830-838 (1996)
by M P Seah
o Comment on "Neglected and Hidden Errors in the Quantification of Auger Electron Spectroscopy" by J du Plessis,
Surface and Interface Analysis 21 587-589 (1994)
by M P Seah
o Quantitative Microbeam Analysis, Proceedings of the Fortieth Scottish Universities Summer School in Physics: A NATO Advanced Study Institute, Eds. A G Fitzgerald, B E Storey and D J Fabian, Institute of Physics, Bristol (1993) p1-41.
Chapter 1, Quantification in AES and XPS
by M P Seah
o AES and XPS Measurements: Reducing the Uncertainty and Improving the Accuracy
Applied Surface Science 70/71 1-8 (1993)
by M P Seah
o Random Uncertainties in AES and XPS: II Quantification using Either Relative or Absolute Measurements
Surface and Interface Analysis 18 361-367 (1992)
by P J Cumpson and M P Seah
o Random Uncertainties in AES and XPS: I Uncertainties in Peak Energies, Intensities and Areas Derived from Peak Synthesis
Surface and Interface Analysis 18 345-360 (1992)
by P J Cumpson and M P Seah
o Quantitative Surface Analysis: Agreeing Initial Data Processing
Journal of Vacuum Science and Technology A9 1227-1233 (1991)
by M P Seah
o Practical Surface Analysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn.
Eds D Briggs and M P Seah, J Wiley, London (1990), p 201-255,
Chapter 5, Quantitative AES and XPS
by M P Seah
[b]
AFM[/b]
• [b] General[/b]
o Metrology at the nano scale
Physics World, August 2005
Ben Sheridan, Peter Cumpson and Marc Bailey
o Nano-Analysis using Atomic Force Microscopy
VAM Bulletin 31 21 - 25 (2004)
by C A Clifford, P J Cumpson and M P Seah
o Quantification issues in ToF-SSIMS and AFM Co-Analysis in Two-Phase Systems, Exampled by a Polymer Blend
Surface and Interface Analysis 35 888-896 (2003)
by I S Gilmore, M P Seah and J E Johnstone
o Cones Formed During Sputtering of InP and their use in Defining AFM Tip Shapes
Applied Surface Science 144-145 151-155 (1999)
M P Seah, S J Spencer, P J Cumpson and J E Johnstone
o Sputter-induced Cone and Filament Formation on InP and AFM Tip Shapes Determination
Surface and Interface Analysis 29 782-790 (2000)
M P Seah, S J Spencer, P J Cumpson and J E Johnstone
• [b] Spring/Force Constant[/b]
o Accurate velocity measurements of AFM-cantilever vibrations by Doppler interferometry
Journal of Experimental Nanoscience, Vol 1 No 1 51-62 (2006)
J F Portoles, P J Cumpson, J Hedley, S Allen, P M Williams and S J B Tendler
o Microelectromechanical device for lateral force calibration in the atomic force microscope: Lateral electrical nanobalance
J. Vac. Sci. Technol. B 23(5) 1992-1997 (2005)
P J Cumpson, J Hedley and C A Clifford
o The determination of atomic force microscope cantilever spring constants via dimensional methods for nanomechanical analysis
Nanotechnology 16 1666-1680 (2005)
C A Clifford and M P Seah
o An optical 'workstation' for characterisation and modification of MEMS
Proceedings of SPIE 5458 244-252 (2004)
J Hedley, J S Burdess, A J Harris, B J Gallacher, C J McNeil, P J Cumpson and S Enderling
o Microelectromechanical system device for calibration of atomic force microscope cantilever spring constants between 0.01 and 4 N/m
J. Vac. Sci. Technol. A 22(4) 1444-1449 (2004)
P J Cumpson, J Hedley, C A Clifford, X Chen and S Allen
o Calibration of AFM cantilever stiffness: a microfabricated array of reflective springs
Ultramicroscopy 100 241-251 (2004)
P J Cumpson, P Zhdan and J Hedley
o Quantitative Analytical Atomic Force Microscopy: A Cantilever Reference Device for Easy and Accurate AFM Spring-Constant Calibration
Measurement Science and Technology 15 1337-1346 (2004)
P J Cumpson, C A Clifford and J Hedley
o Accurate force measurement in the atomic force microscope: a microfabricated array of reference springs for easy cantilever calibration
Nanotechnology 14 918-924 (2003)
P J Cumpson, J Hedley and P Zhdan
o Accurate analytical measurements in the atomic force microscope: a microfabricated spring constant standard potentially traceable to the SI
Nanotechnology 14 1279-1288 (2003)
P J Cumpson and J Hedley
• [b] Modulus measurement/Nanomechanics[/b]
o Modelling of nanomechanical nanoindentation measurements using an AFM or nanoindenter for compliant layers on stiffer substrates
[link to IOP website - free access to full paper until 6 Nov 2006]
Nanotechnology 17 5283-5292 (2006)
C A Clifford and M P Seah
o Quantification Issues in the Identification of Nanoscale regions of Homopolymers using Modulus Measurement via AFM Nanoindentation
Applied Surface Science 252 1915-1933 (2005)
C A Clifford and M P Seah
nanosurface 2006-11-24 22:38
[font=Times New Roman][b][size=3][size=11pt]Angle-Resolved XPSand Electron Transport[/size][/size][/b][/font]
[font=Times New Roman][size=3][/size][/font]
[list][*][size=3][size=11pt]AttenuationLengths[/size][/size][/list][font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi1_263.pdf]Ultra-thinSiO2 on Si: I, Quantifying and Removing Carbonaceous Contamination[/url]
Journal of Vacuum Science and Technology A21 345-352 (2003)
by M P Seah and S J Spencer[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]SimplifiedEquations for Correction Parameters for Elastic Scattering Effects for Q, b andAttenuation Lengths in AES and XPS
Surface and Interface Analysis 31 835-846 (2001)
by M P Seah and I S Gilmore[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]The Thickogram: amethod for easy film thickness measurement in XPS
Surface and Interface Analysis 29 403-406 (2000)
by P J Cumpson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Estimation ofAttenuation Length for Film in Thickness Measurement in XPS and AES
ECASIA 97, European Conference on Applications of Surface and Interface Analysis,Eds I Olefjord, L Nyborg and D Briggs, Wiley, Chichester(1998), p 872-875[/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]by P J Cumpson and M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Elastic ScatteringCorrections in AES and XPS: II. Estimating Attenuation Lengths, and ConditionsRequired for their Valid Use in Overlayer/Substrate Experiments
Surface and Interface Analysis 25 430-446 (1997)
by P J Cumpson and M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Elastic ScatteringCorrections in AES and XPS: III. Behaviour of Electron Transport Mean Free Pathin Solids for Kinetic Energies in the Range 100eV<E<400eV
Surface and Interface Analysis 25 447-456 (1997)
by P J Cumpson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[list][*][size=3][size=11pt]Electron Transport[/size][/size][/list][font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Monte-CarloCalculation of the Depth Distribution Function in Multilayer Structures
Surface and Interface Analysis 25 341-349 (1997)
by A R Jackson, M M ElGomati, J A D Matthew and P J Cumpson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Elastic ScatteringCorrections in AES and XPS: I. RapidMonte-Carlo Methods for Calculating the Depth-Distribution Function
Surface and Interface Analysis 20 727-736 (1993)
by P J Cumpson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[list][*][size=3][size=11pt]Angle-ResolvedXPS[/size][/size][/list][font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Angle-Resolved XPSDepth-Profiling Strategies
Applied Surface Science, 144-145 16-20 (1999)
by P J Cumpson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Angle-Resolved XPSand AES - Depth Resolution Limits and a General Comparison of Properties ofDepth-Profile Reconstruction Methods
Journal of Electron Spectroscopy, 73 25-52 (1995)
by P J Cumpson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]A Simple Method ofDepth Profiling (Stratifying) Contamination Layers Illustrated by Studies onStainless Steel
Surface and Interface Analysis 21 336-341 (1994)
by M P Seah, J H Qiu, P J Cumpson and J E Castle[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt] [/size][/size][/font]
[list][*][size=3][size=11pt]Layer Thicknesses[/size][/size][/list][font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/accthickmeas_286.pdf]AccurateThickness Measurements in Thin Films with Surface Analysis[/url]
Journal of Surface Analysis 12 70-77 (2005)
by M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi7_290.pdf]UltrathinSiO2 on Si, VII: Angular Accuracy in XPS and an Accurate Attenuation Length[/url]
Surface and Interface Analysis 37 731-736 (2005)
by M P Seah and S J Spencer[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi6_284.pdf]UltrathinSiO2 on Si, VI: Evaluation of Uncertainties in Thickness Measurement using XPS[/url]
Surface and Interface Analysis 37 300-309 (2005)
by M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi5_279.pdf]CriticalReview of the Current Status of Thickness Measurements for Ultra-Thin SiO2 onSi: Part V, Results of a CCQM Pilot Study[/url]
Surface and Interface Analysis 36 1269-1303 (2004)
by M P Seah, S J Spencer, F Bensebaa, I Vickridge, H Danzebrink, M Krumrey, TGross, W Oesterle, E Wendler, B Rheinländer, Y Azuma, I Kojima, N Suzuki, MSuzuki, S Tanuma, D W Moon, H J Lee, Hyun Mo Cho, H Y Chen, A T S Wee, TOsipowicz, J S Pan, W A Jordaan, R Hauert, U Klotz, C van der Marel, MVerheijen, Y Tamminga, C Jeynes, P Bailey, S Biswas, U Falke, N V Nguyen, DChandler-Horowitz, J R Ehrstein, D Muller and J A Dura[/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Advances inMeasurement: Neutron Reflectometry for Highly Accurate Nanometer Metrology
Annual Report of Accomplishments and Opportunities of the NIST Centre forNeutron Research, 2004, p46
by J A Dura and M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2multitechniques_280.pdf]Intercomparison of Silicon Dioxide Thickness Measurements Madeby Multiple Techniques - the Route to Accuracy[/url]
Journal of Vacuum Science and Technology A, 22 1564-1571 (2004)
by M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi4_276.pdf]Ultra-thinSiO2 on Si: IV, Thickness Linearity and Intensity Measurement in XPS[/url]
Surface and Interface Analysis 35 515-524 (2003)
by M P Seah and S J Spencer[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi3_271.pdf]Ultra-thinSiO2 on Si: III, Mapping the Layer Thickness Efficiently by XPS[/url]
Surface and Interface Analysis 33 960-963 (2002)
by M P Seah and R White[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/ultrathinsio2onsi.pdf]Ultra-thinSiO2 on Si: II, Issues in Quantification of the Oxide Thickness[/url]
Surface and Interface Analysis 33 640-652 (2002)
by M P Seah and S J Spencer[/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi1_263.pdf]Ultra-thinSiO2 on Si: I, Quantifying and Removing Carbonaceous Contamination[/url]
Journal of Vacuum Science and Technology A21 345-352 (2003)
by M P Seah and S J Spencer[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[list][*][size=3][size=11pt]Data Formats[/size][/size][/list][font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Summary of ISO/TC201 standard: XXII. ISO 22048 : 2004 - Surface chemical analysis - Informationformat for static secondary ion mass spectrometry
Surface and Interface Analysis 36 1642-1644 (2004)
by I S Gilmore, M P Seah and A Henderson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Summary of ISOStandard: I ISO 14976:1998 - Surface Chemical Analysis - Data Transfer Format
Surface and Interface Analysis 27 693-694 (1999)
by M P Seah[/size][/size][/font]
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[list][*][size=3][size=11pt]Data Processing[/size][/size][/list][font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Savitzky and Golaydifferentiation in AES
Applied Surface Science 93 273-280 (1996)
by I S Gilmore and M P Seah[/size][/size][/font]
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[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Comment on"Spectral Noise Removal by Digital Filtering and its Application toSurface Analysis" by K Piyakis and E Sacher
Applied Surface Science 62 195-198 (1992)
by M P Seah and P J Cumpson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]RandomUncertainties in AES and XPS: I Uncertainties in Peak Energies, Intensities andAreas Derived from Peak Synthesis
Surface and Interface Analysis 18 345-360 (1992)
by P J Cumpson and M P Seah[/size][/size][/font]
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[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Quartz CrystalMicrobalance[/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Quartz-CrystalMicrobalance: A New Design Eliminates Sensitivity Outside the Electrodes
Journal of Vacuum Science and Technology A15 2407-2410 (1997)
by P J Cumpson[/size][/size][/font]
[font=Times New Roman]
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[font=Times New Roman][size=3][size=11pt]Quartz-CrystalMicrobalance: Radial/Polar Dependence of Mass-Sensitivity Both On and Off theElectrodes
Measurement Science and Technology 1 544-555 (1990)[/size][/size][/font]
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[font=Times New Roman][b][size=3][size=11pt]Sputtering[/size][/size][/b][/font]
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[list][*][size=3][size=11pt]General[/size][/size][/list][font=Times New Roman]
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[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sputtering2err_300.pdf]Erratumto "An Accurate Semi-Empirical Equation for Sputtering Yields, II: forNeon, Argon and Xenon Ions" [Nuclear Instruments and Methods B 229 348-358(2005)]"[/url]
Nuclear Instruments and Methods B 239 286-287 (2005)
by M P Seah[/size][/size][/font]
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[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sputtering2_283.pdf]AnAccurate Semi-Empirical Equation for Sputtering Yields, II: for Neon, Argon andXenon Ions[/url]
Nuclear Instruments and Methods B 229 348-358 (2005)
by M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sputtering1_282.pdf]AnAccurate Semi-Empirical Equation for Sputtering Yields, I: for Argon Ions[/url]
Surface and Interface Analysis 37 444-458 (2005)[/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]by M P Seah, C A Clifford, F M Green and I S Gilmore[/size][/size][/font]
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[font=Times New Roman][size=3][size=11pt]Sputter-InducedCone and Filament Formation on InP and AFM Tip Shape Determination
Surface and Interface Analysis 29 782-790 (2000)[/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]by M P Seah, S J Spencer, P J Cumpson and J E Johnstone[/size][/size][/font]
[font=Times New Roman]
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[font=Times New Roman][size=3][size=11pt]Cones FormedDuring Sputtering of InP and their use in Defining AFM Tip Shapes
Applied Surface Science 144-145 151-155 (1999)
M P Seah, S J Spencer, P J Cumpson and J E Johnstone[/size][/size][/font]
[list][*][size=3][size=11pt]Sputter DepthProfile Calibration[/size][/size][/list][font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/accthickmeas_286.pdf]AccurateThickness Measurements in Thin Films with Surface Analysis[/url]
Journal of Surface Analysis 12 70-77 (2005)
by M P Seah[/size][/size][/font]
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[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/depthresolutiontantoxid.pdf]Depth Resolution in Sputter Depth Profiling - Characterisationof a Tantalum Pentoxide on Tantalum Certified Reference Material[/url]
Surface and Interface Analysis 29 73-81 (2000)
by M P Seah, S J Spencer, I S Gilmore and J E Johnstone[/size][/size][/font]
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[font=Times New Roman][size=3][size=11pt]Method for theAlignment of Samples and the Attainment of Ultra-high Resolution Depth Profilesin Auger Electron Spectroscopy
Surface and Interface Analysis 15 254-258 (1990)
by C P Hunt and M P Seah[/size][/size][/font]
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[list][*][size=3][size=11pt]Standards[/size][/size][/list][font=Times New Roman]
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[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/repintcalxps_301.pdf]RepeatableIntensity Calibration of an X-ray Photoelectron Spectrometer[/url]
Journal of Electron Spectroscopy 151 178-181 (2006)
by M P Seah and S J Spencer[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Summary of ISO/TC201 Standard: XXII, ISO 22048:2004 - Surface chemical analysis - InformationFormat for Static Secondary-ion Mass Spectrometry
Surface and Interface Analysis 36 1642-1644 (2004)
by I S Gilmore, M P Seah and A Henderson[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/iso21270_287.pdf]Summaryof ISO/TC 201 standard: XXI. ISO 21270: 2004 - Surface chemical analysis -X-ray photoelectron spectroscopy and Auger electron spectrometers - Linearityof intensity scale[/url]
Surface and Interface Analysis 36 1645-1646 (2004)
by M P Seah[/size][/size][/font]
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[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt]Advances inMeasurement: Neutron Reflectometry for Highly Accurate Nanometer Metrology
Annual Report of Accomplishments and Opportunities of the NIST Centre forNeutron Research, 2004, p46
by J A Dura and M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi5_279.pdf]CriticalReview of the Current Status of Thickness Measurements for Ultra-Thin SiO2 onSi: Part V, Results of a CCQM Pilot Study[/url]
Surface and Interface Analysis 36 1269-1303 (2004)
by M P Seah, S J Spencer, F Bensebaa, I Vickridge, H Danzebrink, M Krumrey, TGross, W Oesterle, E Wendler, B Rheinländer, Y Azuma, I Kojima, N Suzuki, MSuzuki, S Tanuma, D W Moon, H J Lee, Hyun Mo Cho, H Y Chen, A T S Wee, TOsipowicz, J S Pan, W A Jordaan, R Hauert, U Klotz, C van der Marel, MVerheijen, Y Tamminga, C Jeynes, P Bailey, S Biswas, U Falke, N V Nguyen, DChandler-Horowitz, J R Ehrstein, D Muller and J A Dura[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2multitechniques_280.pdf]Intercomparison of Silicon Dioxide Thickness Measurements Madeby Multiple Techniques - the Route to Accuracy[/url]
Journal of Vacuum Science and Technology A, 22 1564-1571 (2004)
by M P Seah[/size][/size][/font]
[font=Times New Roman]
[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/calibaesxps_274.pdf]SurfaceAnalysis by Auger and X-Ray Photoelectron Spectroscopy[/url]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p167-189
Chapter 7, Instrument Calibration for AES and XPS
by M P Seah[/size][/size][/font]
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[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/quantaesxps_275.pdf]SurfaceAnalysis by Auger and X-Ray Photoelectron Spectroscopy[/url]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p345-375
Chapter 13, Quantification in AES and XPS
by M P Seah[/size][/size][/font]
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[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/iso17973_272.pdf]Summaryof ISO Standard: XI ISO 17973:2002 Surface Chemical Analysis - Medium ResolutionAuger Electron Spectrometers - Calibration of Energy Scales for ElementalAnalysis[/url]
Surface and Interface Analysis 35 329-340 (2003)
by M P Seah[/size][/size][/font]
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[size=3][size=11pt][/size][/size][/font]
[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/iso17974_273.pdf]Summaryof ISO standard: XI ISO 17974:2002 Surface Chemical Analysis - High ResolutionAuger Electron Spectrometers - Calibration of Energy Scales for Elemental andChemical State Analysis[/url]
Surface and Interface Analysis 35 327-328 (2003)
by M P Seah[/size][/size][/font]
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[font=Times New Roman][size=3][size=11pt][url=http://www.npl.co.uk/nanoanalysis/iso15472.pdf]Summaryof ISO/TC 201 Standard: VII ISO 15472-2001 - Surface Chemical Analysis - X-rayPhotoelectron Spectrometers - Calibration of Energy Scales[/url]
Surface and Interface Analysis 31 721-723 (2001)
by M P Seah[/size][/size][/font]
[[i] 本帖最后由 nanosurface 于 2006-11-24 22:49 编辑 [/i]]
nanosurface 2006-11-24 22:55
[size=11pt]Standards forSurface Analysis; A Clash Between Bureaucracy and Science?
Philosophical Transactions of the Royal Society 354, 2765-2780 (1996)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Practical SurfaceAnalysis Volume 2:
Ion and Neutral Spectrometries, Eds D Briggs and M P Seah, J Wiley London (1992) pp 729 -731
Appendix 6, Fundamental Physical Constants and Energy Conversion Factors
by M P Seah[/size]
[size=11pt][/size]
[b][size=11pt]SSIMS (StaticSecondary Ion Mass Spectrometry)[/size][/b]
[size=11pt][/size]
[list][*][size=11pt]Damage[/size][/list]
[size=11pt][/size]
[size=11pt]Quantificationissues in ToF-SSIMS and AFM Co-Analysis in Two-Phase Systems, Exampled by aPolymer Blend
Surface and Interface Analysis 35 888-896 (2003)
by I S Gilmore, M P Seah and J E Johnstone[/size]
[size=11pt][/size]
[size=11pt]Investigating theDifficulty of Eliminating Flood Gun Damage in TOF-SIMS
Applied Surface Science 203-204 600-604 (2003), Proceedings of SIMS XIII
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Electron Flood GunDamage in the Analysis of Polymers and Organics in Time of Flight SIMS
Applied Surface Science 187 89-100 (2002)
by I S Gilmore and M P Seah[/size]
[size=11pt] [/size]
[size=11pt]Static SIMS ofInsulators: Damage and the Development of Measurement Reliability
ECASIA 95, European Conference on Applications of Surface and InterfaceAnalysis, Eds H J Mathieu, B Reihl and D Briggs, Wiley, Chichester (1996),p975-978
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Static SIMS: AStudy of Damage using Polymers
Surface and Interface Analysis 24 746-762 (1996)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[b][size=11pt]Detectors[/size][/b]
[size=11pt][/size]
[list][*][size=11pt][url=http://www.npl.co.uk/nanoanalysis/tofsimsmassscale.pdf]TOF-SIMS:Accurate Mass Scale Calibration[/url][/size][/list][size=11pt]
Journal of the American Society for Mass Spectrometry 17 4 514-523 (2006)
by F M Green, I S Gilmore & M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/iondetectionefficiency.pdf]Ion Detection Efficiency in SIMS: Energy, Mass and CompositionDependencies for Microchannel Plates used in Mass Spectrometers[/url]
International Journal of Mass Spectrometry 202 217-229 (2000)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Static SIMS: IonDetection Efficiencies in a Channel Electron Multiplier
Applied Surface Science 144-145 113-117 (1999)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Fluence, Flux,Current and Current Density Measurement in Faraday Cups for Surface Analysis
Surface and Interface Analysis 23 248-258 (1995)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[list][*][size=11pt]GSIMS[/size][/list]
[size=11pt][/size]
[size=11pt]G-SIMS - DirectAnalysis of Organic Surfaces[/size]
[size=11pt]VAM Bulletin 31 17 - 21 (2004)
by I S Gilmore[/size]
[size=11pt][/size]
[size=11pt]Organic MoleculeCharacterization - G-SIMS
Applied Surface Science 231-232 224-229 (2004)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/gsimsofcrystallisableorganics.pdf]G-SIMS of Crystallisable Organics[/url]
Applied Surface Science 203-204 551-555 (2003), Proceedings of SIMS XIII
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/gsims.pdf]Static SIMS:Towards Unfragmented Mass Spectra - The G-SIMS Procedure[/url]
Secondary Ion Mass Spectrometry, SIMS XII, Eds A Benninghoven, P Bertrand, H-NMigeon and H W Werner, Elsevier, Amsterdam (2000) p 801-804
by I S Gilmore, M P Seah and J E Johnstone[/size]
[size=11pt][/size]
[size=11pt]Static SIMS:Towards Unfragmented Mass Spectra - The G-SIMS Procedure
Applied Surface Science 161 465-480 (2000)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[list][*][size=11pt]Intensitycalibration[/size][/list]
[size=11pt][/size]
[size=11pt]Static TOF-SIMS -a VAMAS interlaboratory study. Part I. Repeatability and reproducibilty ofspectra
Surface and Interface Analysis 37 651-672 (2005)
by I S Gilmore, M P Seah and F M Green[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/staticsimsinterlabupdate.pdf]Static ToF-SIMS – A VAMAS Interlaboratory Study, 2002 -Repeatability Update[/url]
by I S Gilmore and M P Seah[/size]
[size=11pt] [/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/lowenergyfloodgundamage.pdf]Investigating The Difficulty Of Eliminating Flood Gun Damage InTOF-SIMS[/url]
Applied Surface Science, Submitted.
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Electron Flood GunDamage In The Analysis Of Polymers And Organics In Time Of Flight SIMS
Applied Surface Science 187 89-100 (2002)
by I S Gilmore and M P Seah[/size]
[size=11pt] [/size]
[size=11pt]Role of OperatingConditions in Time-of-Flight Secondary Ion Mass Spectrometry
by I S Gilmore in "ToF-SIMS: SurfaceAnalysis by Mass Spectrometry"
SurfaceSpectra/IMPublications, 2001
Eds. J C Vickerman and D Briggs[/size]
[size=11pt] [/size]
[size=11pt]Ion DetectionEfficiency in SIMS: Energy, Mass and Composition Dependencies for MicrochannelPlates used in Mass Spectrometers
International Journal of Mass Spectrometry 202 217-229 (2000)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Static SIMS: IonDetection Efficiencies in a Channel Electron Multiplier
Applied Surface Science 144-145 113-117 (1999)
by I S Gilmore and M P Seah[/size]
[list][*][size=11pt]Static SIMS: AnInter-laboratory Study[/size][/list]
[size=11pt]Secondary Ion Mass Spectrometry, SIMS XI, Eds G Gillen, R Lareau, J Bennett andF Stevie, Wiley, Chichester (1998) p 999-1002
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Static SIMS: AnInter-laboratory Study
Surface and Interface Analysis 29 624-637 (2000)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Static SIMS - AReliable Technique: Results from an Interlaboratory Study
ECASIA 97, European Conference on Applications of Surface and InterfaceAnalysis, Eds I Olefjord, L Nyborg and D Briggs, Wiley, Chichester (1998), p 1081-1084
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Static SIMS:Surface Charge Neutralisation of Insulators for Highly Repeatable Spectra whenUsing a Quadrupole Mass Spectrometer
Surface and Interface Analysis 23 191-203 (1995)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[list][*][size=11pt]Interpretation[/size][/list]
[size=11pt][/size]
[size=11pt]Organic MoleculeCharacterization - G-SIMS
Applied Surface Science 231-232 224-229 (2004)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/gsimsofcrystallisableorganics.pdf]G-SIMS of Crystallisable Organics[/url]
Applied Surface Science 203-204 551-555 (2003), Proceedings of SIMS XIII
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Static SIMSMetastable Decay and Peak Intensities
Applied Surface Science 144-145 26-30 (1999)
by I S Gilmore and M P Seah[/size]
[size=11pt][/size]
[list][*][size=11pt]Quantification[/size][/list]
[size=11pt][/size]
[size=11pt]Quantificationissues in ToF-SSIMS and AFM Co-Analysis in Two-Phase Systems, Exampled by aPolymer Blend
Surface and Interface Analysis 35 888-896 (2003)
by I S Gilmore, M P Seah and J E Johnstone[/size]
[size=11pt]XPS[/size]
[size=11pt][/size]
[list][*][size=11pt]Damage[/size][/list]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/degradxps_278.pdf]Degradationof Poly(Vinyl Chloride) and Nitrocellulose in XPS[/url]
Surface and Interface Analysis 35 906-913 (2003)
by M P Seah and S J Spencer[/size]
[size=11pt][/size]
[list][*][size=11pt]Detectors[/size][/list]
[size=11pt][/size]
[size=11pt]Method forDetermining the Signal Linearity in Single and Multidetector Counting Systemsin XPS
Applied Surface Science 144-145 132-136 (1999)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]Signal linearityin XPS counting systems
Journal of Electron Spectroscopy 104 73-89 (1999)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]Effective DeadTime in Pulse Counting Systems
Surface and Interface Analysis 23 729-732 (1995)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Linearity inElectron Counting and Detection Systems
Surface and Interface Analysis 18 240-246 (1992)
by M P Seah and M Tosa[/size]
[size=11pt][/size]
[size=11pt]Energy and SpatialDependence of the Electron Detection Efficiencies of Single Channel ElectronMultipliers used in Electron Spectroscopy
Review of Scientific Instruments 62 62-68 (1991), Reprinted in Photon CountingDetectors, Ed A Smith, SPIE Optical Engineering Press, Bellingham, WA (1998).
by M P Seah and G C Smith[/size]
[size=11pt][/size]
[size=11pt]Channel ElectronMultipliers: Quantitative Intensity Measurement - Efficiency, Gain, Linearityand Bias Effects
Journal of Electron Spectroscopy 50 137-157 (1990)
by M P Seah[/size]
[size=11pt][/size]
[list][*][size=11pt]Energy calibration[/size][/list]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/calibaesxps_274.pdf]SurfaceAnalysis by Auger and X-Ray Photoelectron Spectroscopy[/url]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p167-189
Chapter 7, Instrument Calibration for AES and XPS
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Measurement ofData for and the Development of an ISO Standard for the Energy Calibration ofX-ray Photoelectron Spectrometers
Applied Surface Science 144-145 178-182 (1999)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]XPS: BindingEnergy Calibration of Electron Spectrometers 5 - A Re-assessment of theReference Energies
Surface and Interface Analysis 26 642-649 (1998)
by M P Seah, I S Gilmore and G Beamson[/size]
[size=11pt][/size]
[size=11pt]XPS: EnergyCalibration of Electron Spectrometers, 4 - An Assessment of Effects forDifferent Conditions and of the Overall Uncertainties
Surface and Interface Analysis 26 617-641 (1998)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]Simple Procedure forPrecise Peak Maximum Estimation for Energy Calibration in AES and XPS
Surface and Interface Analysis 24 687-694 (1996)
by P J Cumpson, M P Seah and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]Calibration of theBinding Energy Scale of an X-ray Photoelectron Spectrometer.
UKESCA Users Group Newsletter 15 6-10, April (1993)
by M P Seah and C P Hunt[/size]
[size=11pt][/size]
[size=11pt]Practical SurfaceAnalysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn.
Eds D Briggs and M P Seah, J Wiley, London(1990), p 541-553
Appendix 2, Charge Referencing Techniques for Insulators
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Practical SurfaceAnalysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn
Eds D Briggs and M P Seah, J Wiley, London(1990), p 531-540
Appendix 1, Spectrometer Energy Scale Calibration
by M P Seah and G C Smith[/size]
[size=11pt][/size]
[list][*][size=11pt]Intensitycalibration[/size][/list]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/repintcalxps_301.pdf]Repeatableintensity calibration of an X-ray Photoelectron Spectrometer[/url]
Journal of Electron Spectroscopy 151 178-181 (2006)
by M P Seah and S J Spencer[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/iso21270_287.pdf]Summaryof ISO/TC 201 standard: XXI. ISO 21270: 2004 - Surface chemical analysis -X-ray photoelectron spectroscopy and Auger electron spectrometers - Linearityof intensity scale[/url]
Surface and Interface Analysis 36 1645-1646 (2004)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/calibaesxps_274.pdf]SurfaceAnalysis by Auger and X-Ray Photoelectron Spectroscopy[/url]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p167-189
Chapter 7, Instrument Calibration for AES and XPS
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]The Alignment ofSpectrometers and Quantitative Measurements in X-ray Photoelectron Spectroscopy
Journal of Electron Spectroscopy 87 159-167 (1997)
by M P Seah, S J Spencer, F Bodino and J J Pireaux[/size]
nanosurface 2006-11-24 23:00
[size=11pt]A System for theIntensity Calibration of Electron Spectrometers
Journal of Electron Spectroscopy 71 191-204 (1995)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Scattering inElectron Spectrometers, Diagnosis and Avoidance, I: Concentric HemisphericalAnalysers
Surface and Interface Analysis 20 865-875 (1993)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Signal-to-NoiseAssessment and Measurement in Spectroscopies with Particular Reference to Augerand X-ray Photoelectron Spectroscopies
Journal of Electron Spectroscopy 61 291-308 (1993)
by M P Seah and P J Cumpson[/size]
[size=11pt][/size]
[size=11pt]XPS: ReferenceProcedures for the Accurate Intensity Calibration of Electron Spectrometers -Results of a BCR Intercomparison Co-sponsored by the VAMAS SCA TWP
Surface and Interface Analysis 20 243-266 (1993)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Standard ReferenceSpectra for XPS and AES: Their Derivation, Validation and Use.
Surface and Interface Analysis 16 144-148 (1990)
by G C Smith and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Quantitative AESand XPS: Calibration of Electron Spectrometers for True Spectral Measurements -VAMAS Round Robins and Parameters for Reference Spectral Data Banks
Vacuum 41 1601-1604 (1990)
by M P Seah and G C Smith[/size]
[size=11pt][/size]
[size=11pt]Quantitative AESand XPS. Determination of the Electron Spectrometer Transmission Function andthe Detector Sensitivity Energy Dependencies for the Production of TrueElectron Emission Spectra in AES and XPS
Surface and Interface Analysis 15 751-766 (1990)
by M P Seah and G C Smith[/size]
[size=11pt][/size]
[list][*][size=11pt]Peak synthesis[/size][/list]
[size=11pt][/size]
[size=11pt]Validation andAccuracy of Peak Synthesis Software for XPS
Applied Surface Science 144-145 183-187 (1999)
by M P Seah and M T Brown[/size]
[size=11pt][/size]
[size=11pt]Validation andAccuracy of Software for Peak Synthesis in XPS
Journal of Electron Spectroscopy 95 71-93 (1998)
by M P Seah and M T Brown[/size]
[size=11pt][/size]
[size=11pt]Validation ofSoftware for the Analysis of Peak Areas in XPS
ECASIA 97, European Conference on Applications of Surface and InterfaceAnalysis, Eds I Olefjord, L Nyborg and D Briggs, Wiley, Chichester (1998), p856-859
by M P Seah and M T Brown[/size]
[size=11pt][/size]
[list][*][size=11pt]General procedures[/size][/list]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/degradxps_278.pdf]Degradationof poly(vinyl chloride) and nitrocellulose in XPS[/url]
Surface and Interface Analysis 35 906-913 (2003)
by M P Seah and S J Spencer[/size]
[size=11pt][/size]
[list][*][size=11pt]Reviews[/size][/list]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/calibaesxps_274.pdf]SurfaceAnalysis by Auger and X-Ray Photoelectron Spectroscopy[/url]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p167-189
Chapter 7, Instrument Calibration for AES and XPS
by M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/quantaesxps_275.pdf]SurfaceAnalysis by Auger and X-Ray Photoelectron Spectroscopy[/url]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p345-375
Chapter 13, Quantification in AES and XPS
by M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/reelsbackground.pdf]QuantitativeAES and XPS: Tests of Theory Using AES and XPS Databases with REELS BackgroundSubtraction[/url]
Journal of Surface Analysis 9 275-280 (2002)
by M P Seah[/size]
[size=11pt] [/size]
[size=11pt]Consistent,Combined Quantitative AES and XPS Digital Data Bases - Convergence of Theoryand Experiment
Journal of Vacuum Science and Technology A18 1083-1088 (2000)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]New Aspects inQuantitative Surface Analysis[/size][size=11pt]Journal of Surface Analysis 5 7-11 (1999)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Quantitative AESand XPS - Convergence Between Theory and Experimental Data Bases
Journal of Electron Spectroscopy 100 55-73 (1999)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Reference Data forAES and XPS Combined
Applied Surface Science 144-145 161-167 (1999)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Calibration ofAuger and X-ray Photoelectron Spectrometers for Valid Analytical Measurements
Spectroscopy Europe 10 8-14 (1998)
by P J Cumpson, S J Spencer and M P Seah[/size]
[size=11pt][/size]
[size=11pt]Surface ChemicalAnalysis: Comparing and Exchanging Data
Journal of Vacuum Science and Technology 15 485-492 (1997)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Practical SurfaceAnalysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn.
Eds D Briggs and M P Seah, J Wiley London(1990), p 1-18
Chapter 1, A Perspective of the Analysis of Surfaces and Interfaces
by M P Seah and D Briggs[/size]
[size=11pt][/size]
[size=11pt]Precision,Accuracy and Uncertainty in Quantitative Surface Analysis by Auger ElectronSpectroscopy and X-Ray Photoelectron Spectroscopy
Journal of Vacuum Science and Technology A8 735-763 (1990)
by C J Powell and M P Seah[/size]
[size=11pt][/size]
[list][*][size=11pt]Quantification[/size][/list]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/quantxps_293.pdf]Quantitativex-ray photoelectron spectroscopy: Quadrupole effects, shake-up, Shirleybackground and relative sensitivity factors[/url]
Physical Review B 73 174113 (2006)
by M P Seah and I S Gilmore[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi7_290.pdf]UltrathinSiO2 on Si, VII: Angular Accuracy in XPS and an Accurate Attenuation Length[/url]
Surface and Interface Analysis 37 731 - 736 (2005)
by M P Seah and S J Spencer[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi6_284.pdf]UltrathinSiO2 on Si, VI: Evaluation of Uncertainties in Thickness Measurement using XPS[/url]
Surface and Interface Analysis 37 300-309 (2005)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi5_279.pdf]CriticalReview of the Current Status of Thickness Measurements for Ultra-Thin SiO2 onSi: Part V, Results of a CCQM Pilot Study[/url]
Surface and Interface Analysis 36 1269-1303 (2004)
by M P Seah, S J Spencer, F Bensebaa, I Vickridge, H Danzebrink, M Krumrey, TGross, W Oesterle, E Wendler, B Rheinländer, Y Azuma, I Kojima, N Suzuki, MSuzuki, S Tanuma, D W Moon, H J Lee, Hyun Mo Cho, H Y Chen, A T S Wee, TOsipowicz, J S Pan, W A Jordaan, R Hauert, U Klotz, C van der Marel, MVerheijen, Y Tamminga, C Jeynes, P Bailey, S Biswas, U Falke, N V Nguyen, DChandler-Horowitz, J R Ehrstein, D Muller and J A Dura[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2multitechniques_280.pdf]Intercomparison of Silicon Dioxide Thickness Measurements Madeby Multiple Techniques - the Route to Accuracy[/url]
Journal of Vacuum Science and Technology A, 22 1564-1571 (2004)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/quantaesxps_275.pdf]SurfaceAnalysis by Auger and X-Ray Photoelectron Spectroscopy[/url]
Eds D Briggs and J T Grant, SurfaceSpectra Ltd/I M Publications (2003), p345-375
Chapter 13, Quantification in AES and XPS
by M P Seah[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi4_276.pdf]Ultra-thinSiO2 on Si: IV, Thickness Linearity and Intensity Measurement in XPS[/url]
Surface and Interface Analysis 35 515-524 (2003)
by M P Seah and S J Spencer[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi3_271.pdf]Ultra-thinSiO2 on Si: III, Mapping the Layer Thickness Efficiently by XPS[/url]
Surface and Interface Analysis 33 960-963 (2002)
by M P Seah and R White[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/ultrathinsio2onsi.pdf]Ultra-thinSiO2 on Si: II, Issues in Quantification of the Oxide Thickness[/url]
Surface and Interface Analysis 33 640-652 (2002)
by M P Seah and S J Spencer[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/sio2onsi1_263.pdf]Ultra-thinSiO2 on Si: I, Quantifying and Removing Carbonaceous Contamination[/url]
Journal of Vacuum Science and Technology A21 345-352 (2003)
by M P Seah and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]Quantitative AESIX and Quantitative XPS II: Auger and X-ray Photoelectron Intensities fromElemental Spectra in Digital Databases Reanalysed with a REELS Database
Surface and Interface Analysis 31 778-795 (2001)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/qspr.pdf]Estimation of inelastic meanfree paths for polymers and other organic materials: use of quantitativestructure-property relationships[/url]
Surface and Interface Analysis 31 23-34 (2001)
by P J Cumpson[/size]
[size=11pt][url=http://www.npl.co.uk/nanoanalysis/quantxps1.pdf]QuantitativeXPS, I: Analysis of X-ray Photoelectron Intensities from Elemental Data in aDigital Photoelectron Database[/url]
Journal of Electron Spectroscopy 120 93-111 (2001)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]BackgroundSubtraction III: The Application of REELS Data to Background Removal in AES andXPS
Surface Science 471 185-202 (2001)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]BackgroundSubtraction II: General Behaviour of REELS and the Tougaard Universal CrossSection in the Removal of Backgrounds in AES and XPS
Surface Science 461 1-15 (2000)
by M P Seah, I S Gilmore and S J Spencer[/size]
[size=11pt][/size]
[size=11pt]BackgroundSubtraction, I: General Behaviour of Tougaard - Style Backgrounds in AES andXPS
Surface Science 420 285-294 (1999)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]QuantitativeMicrobeam Analysis, Proceedings of the Fortieth Scottish Universities SummerSchool in Physics: A NATO Advanced Study Institute, Eds. A G Fitzgerald, B EStorey and D J Fabian, Institute of Physics, Bristol (1993) p1-41.
Chapter 1, Quantification in AES and XPS
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]AES and XPSMeasurements: Reducing the Uncertainty and Improving the Accuracy
Applied Surface Science 70/71 1-8 (1993)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]RandomUncertainties in AES and XPS: II Quantification using Either Relative or AbsoluteMeasurements
Surface and Interface Analysis 18 361-367 (1992)
by P J Cumpson and M P Seah[/size]
[size=11pt][/size]
[size=11pt]RandomUncertainties in AES and XPS: I Uncertainties in Peak Energies, Intensities andAreas Derived from Peak Synthesis
Surface and Interface Analysis 18 345-360 (1992)
by P J Cumpson and M P Seah[/size]
[size=11pt][/size]
[size=11pt]QuantitativeSurface Analysis: Agreeing Initial Data Processing
Journal of Vacuum Science and Technology A9 1227-1233 (1991)
by M P Seah[/size]
[size=11pt][/size]
[size=11pt]Practical SurfaceAnalysis Volume 1: Auger and X-ray Photoelectron Spectroscopy, 2nd Edn.
Eds D Briggs and M P Seah, J Wiley, London(1990), p 201-255
Chapter 5, Quantitative AES and XPS
by M P Seah[/size]
[size=11pt][/size]
[b][size=11pt]VAMAS[/size][/b]
[size=11pt][/size]
[size=11pt]Static TOF-SIMS -a VAMAS interlaboratory study. Part I. Repeatability and reproducibilty ofspectra
Surface and Interface Analysis 37 651-672 (2005)
by I S Gilmore, M P Seah and F M Green[/size]
[size=11pt]VAMAS SurfaceChemical Analysis - A Unifying Approach for the 1990s
Surface and Interface Analysis 19 247-252 (1992)
by M P Seah[/size]
[size=11pt][/size]
[font="][size=11pt]VAMAS Surface ChemicalAnalysis Technical Working Party - An Overview of Project Objectives, Progressand the Requirements for Further Work
Surface and Interface Analysis 16 135-139 (1990)
by M P Sea[/size][/font]
jiaoyi 2007-08-13 20:09
这么多……晕！辛苦了！！
guli_phoenix 2008-04-29 09:04
信息量很大啊 谢楼主分享 顶顶顶
xiusi 2008-09-24 22:50
顶！！！！！！！！！！！！！！
正在找这些东东！
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